On September 17, Henan Silane Science and Technology Development Co., Ltd. (hereinafter referred to as: silane Technology) issued a notice on the proposed construction of 500 tons / year semiconductor silicon material project.
The announcement shows that the zone melting grade polysilicon project led by silane technology has achieved phased results. The research and development samples of this project have been tested and tested in third-party professional testing institutions and trial manufacturers respectively. According to the test report and test feedback, various indicators are basically consistent with foreign imported products, and the company plans to build a 500 ton / year semiconductor silicon material project. The implementation of the project is conducive to the localization of zone melting grade (electronic grade) polysilicon materials and promote the strategic development of the company.
It is reported that the total investment of the project is 360 million yuan, and it is proposed to build 500t / a high-purity polysilicon (of which the finished product rate of zone melting grade polysilicon accounts for 60%, and the other is electronic grade polysilicon). The construction period of the project is 12 months. The enterprise of the project will raise 30% of its own funds as project capital, and the remaining 70% of the funds will apply for bank loans.
According to Silane Technology, electronic-grade polysilicon is the key raw material for the production of chips, and zone-melting-grade polysilicon is a high-end product of electronic-grade polysilicon, which is mainly used in the manufacture of high-voltage and high-power semiconductor devices such as IGBT, high-voltage rectifiers and high-voltage transistors. The implementation of this project is of great significance to the company's long-term sustainable development, while conducive to the development of localization in this field, with good social benefits.
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