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Alphabet's Google (GOOG.O) announced on October 15 that its Quantum AI team has successfully validated a new technique called "Magic State Cultivation" on the Willow quantum chip, reducing the error rate of specific quantum states by approximately 40 times and achieving a quantum state preparation accuracy of 99.99%. The related research findings have been published in the journal Science. Google explained that quantum computers are susceptible to interference that causes errors, and to perform complex computations, special quantum states need to be prepared in advance, but this process is highly resource-intensive. Some studies estimate that conventional methods could consume up to 95% of a quantum computer's computing power. The new technique improves preparation efficiency by detecting and discarding quantum states with errors, and is expected to reduce the resource consumption of error correction in future quantum computers. Google stated that this achievement is an important step toward practical quantum computing, but further validation is still needed to determine whether it can be applied to larger-scale quantum computing systems.

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The 26th China International Industry Fair is being held at the National Exhibition and Convention Center, where over a hundred Shanghai scientific and technological achievements are on display in the Innovation Technology Pavilion. At the Landau Suiyan booth, an EUV light source system prototype is making its debut at the fair. It is currently the most advanced domestically developed EUV light source prototype on public display, and is also known as the "heart" of high-end lithography machines. EUV light sources are one of the three core parts for manufacturing advanced process chips at 7 nm and below. They have long been subject to technology monopolies and embargoes outside China, making them a key link constraining China's ability to independently control high-end chips. On-site staff introduced that the light source system on display has achieved 90% localisation, with the vast majority of core parts independently developed through R&D. Its technical route is consistent with that of leading international producers, and it can be used for chip exposure testing. Although mass production is still 3–5 years away, this breakthrough marks a key step in moving China's EUV light source from the laboratory toward industrialisation.